发明名称 APPARATUS AND METHOD FOR MITIGATING DYNAMIC IR VOLTAGE DROP AND ELECTROMIGRATION AFFECTS
摘要 An integrated circuit structure includes a plurality of power or ground rails for an integrated circuit, the plurality of power or ground rails vertically separated on a plane, a plurality of functional cells between the plurality of power rails or between the plurality of ground rails or both, and a jumper connection between the vertically separated power rails or ground rails, the jumper connection within a vertically aligned gap among the plurality of functional cells. A method of mitigating IR drop and electromigration affects in an integrated circuit includes forming a plurality of power rails or ground rails, each of the power rails or ground rails on separate vertical levels of a plane of an integrated circuit layout and connecting with a jumper connection at least two power rails or two ground rails, the jumper connection within a vertically aligned gap among cells of the integrated circuit.
申请公布号 US2014264924(A1) 申请公布日期 2014.09.18
申请号 US201313859797 申请日期 2013.04.10
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 YU Chih-Yeh;HOU Yuan-Te;FU Chung-Min;CHEN Wen-Hao;LO Wan-Yu
分类号 H01L23/528;H01L21/768 主分类号 H01L23/528
代理机构 代理人
主权项 1. An integrated circuit structure, comprising: a plurality of power rails or ground rails of a power grid for an integrated circuit, the plurality of power rails or ground rails being vertically separated on a plane of the integrated circuit; a plurality of functional cells between the plurality of power rails or between the plurality of ground rails or both; and a jumper connection between at least two of the vertically separated power rails or between at least two of the vertically separated ground rails, the jumper connection arranged and constructed within a vertically aligned gap among the plurality of functional cells.
地址 Hsin-Chu TW