SILICON SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To inexpensively manufacture and provide a silicon substrate having a new shape on the surface side opposite to a texture by performing high quality cleaning on the silicon substrate of substrate surface azimuth (100) having a texture structure by a gas etching method for improving light utilization efficiency.SOLUTION: The silicon substrate of substrate surface azimuth (100) has a texture. On the surface opposite to the texture formation surface, a quadrangular minute unevenness is formed in a ripple shape and the depth of a recess is 10-200 nm.