发明名称 SPLIT GATE NON-VOLATILE MEMORY (NVM) CELL AND METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a non-volatile memory cell having a split gate memory structure.SOLUTION: A split gate memory structure includes a pillar of an active region. A first source/drain region is disposed at a first end of the pillar, and a second source/drain region is disposed at a second end opposite to the first end. A channel region exists between the first and second source/drain regions. The pillar has a major surface extending between the first and second ends, which exposes the first and second source/drain regions. A select gate is adjacent to the first source/drain region and a first portion of the channel region, and encircles the major surface of the pillar. A charge storage layer is adjacent to the second source/drain region and a second portion of the channel region, and encircles the major surface of the pillar. A control gate is adjacent to the charge storage layer, and encircles the pillar.</p>
申请公布号 JP2014170936(A) 申请公布日期 2014.09.18
申请号 JP20140036991 申请日期 2014.02.27
申请人 FREESCALE SEMICONDUCTOR INC 发明人 KANG SUNG-TAEG;HONG CHEONG MIN
分类号 H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/336
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