发明名称 Dual Control Modes
摘要 Systems and methods for using variables based on a state associated with a plasma system. A method includes determining whether the state associated with the plasma system is a first state or a second state and determining a first variable upon determining that the state is the first state. The first variable is determined based on a measurement at a communication medium. The method further includes determining a second variable upon determining that the state is the second state. The second variable is determined based on a measurement at the communication medium. The method includes determining whether the second variable exceeds a first threshold, providing an instruction to reduce power supplied to a plasma chamber upon determining that the second variable exceeds the first threshold, and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold.
申请公布号 US2014265852(A1) 申请公布日期 2014.09.18
申请号 US201414184654 申请日期 2014.02.19
申请人 Lam Research Corporation 发明人 Valcore, JR. John C.
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. A method for using different variables based on a state associated with a plasma system, comprising: determining whether the state associated with the plasma system is a first state or a second state; determining a first variable upon determining that the state is the first state, the first variable determined based on a measurement at a communication medium, the communication medium located between a radio frequency (RF) generator and a plasma chamber of the plasma system; determining a second variable upon determining that the state is the second state, the second variable determined based on a measurement at the communication medium; determining whether the second variable exceeds a first threshold; providing an instruction to reduce power supplied to the plasma chamber upon determining that the second variable exceeds the first threshold; and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold, wherein the method is executed by one or more processors.
地址 Fremont CA US