发明名称 HIGH-THROUGHPUT PARTICLE PRODUCTION USING A PLASMA SYSTEM
摘要 The present disclosure relates to a nanoparticle production system and methods of using the system. The nanoparticle production system includes a plasma gun including a male electrode, a female electrodes and a working gas supply configured to deliver a working gas in a vortexing helical flow direction across a plasma generation region. The system also includes a continuous feed systems, a quench chamber, a cooling conduit that includes a laminar flow disruptor, a system overpressure module, and a conditioning fluid purification and recirculation system.
申请公布号 US2014263190(A1) 申请公布日期 2014.09.18
申请号 US201414207087 申请日期 2014.03.12
申请人 SDCmaterials, Inc. 发明人 Biberger Maximilian A.;Leamon David;Layman Frederick P.;Lefevre Paul
分类号 B23K10/00 主分类号 B23K10/00
代理机构 代理人
主权项 1. A nanoparticle production system comprising: a plasma gun; and a continuous feed systems configured to feed material into the plasma gun at a rate of at least 9 grams/minute.
地址 Tempe AZ US