SUBSTRATE PROCESSING DEVICE, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE STORAGE UNIT CONVEYANCE METHOD AND PROGRAM

摘要

The present invention is provided with the following: a processing container which houses a substrate; substrate housing conveyance devices for conveying a substrate housing which houses the substrate; a purge unit for providing purge gas to the inside of the substrate housing at the substrate housing conveyance devices; a substrate housing stand-by unit for storing the substrate housing; a purge unit contact suppression unit provided to the substrate housing stand-by unit and formed so that when the substrate housing is transferred between the substrate housing conveyance devices, contact with the purge unit is suppressed; and a control unit for controlling the substrate housing conveyance devices and the purge unit.