| 摘要 |
<p>A projection lens for imaging a pattern arranged in an object plane (OS) of the projection lens into an image plane of the projection lens by means of electromagnetic radiation having an operating wavelengthλ<260 nm has a multiplicity of optical elements having optical surfaces which are arranged in a projection beam path between the object plane (OS) and the image plane. Provision is made of a wavefront manipulation system for dynamically influencing the wavefront of the projection radiation passing from the object plane to the image plane. The wavefront manipulation system has a first manipulator, which has a first manipulator surface (MS1) arranged in the projection beam path and a first actuating device (DR1) for reversibly altering the surface shape and/or refractive index distribution of the first manipulator surface. The first manipulator is configured in such a way that across an optically used region of the first manipulator surface having a maximum diameter DFP it is possible to generate a number NMAX>1 of maxima and a number NMIN>1 of minima of an optical path length change of the projection radiation according to a characteristic period PCHAR=DFP/((NMAX+NMIN)/2). The first manipulator surface is arranged at a finite first distance (D1) from a closest field plane (OS) of the projection lens in optical proximity to said field plane in such a way that each beam emerging from a field point of the field plane at the first manipulator surface illuminates a subaperture having a subaperture diameter SAD and the condition SAD/DFP< 0.2 holds true at the first manipulator surface.</p> |
