发明名称 Non-Volatile Memory Devices and Methods of Fabricating the Same
摘要 A nonvolatile memory device is provided. The nonvolatile memory device comprises a plurality of impurity regions formed in a substrate, a first contact electrically connected to at least one of the impurity regions, a second contact electrically connected to at least one of the impurity regions, a first information storage portion formed at a first height from the substrate and electrically connected to the first contact, and a second information storage portion formed at a second height, which is different from the first height, from the substrate and electrically connected to the second contact.
申请公布号 US2014264680(A1) 申请公布日期 2014.09.18
申请号 US201414195891 申请日期 2014.03.04
申请人 Kim Whan-Kyun;Kim Young-Hyun;Kim Woo-Jin 发明人 Kim Whan-Kyun;Kim Young-Hyun;Kim Woo-Jin
分类号 H01L27/22;H01L43/02 主分类号 H01L27/22
代理机构 代理人
主权项 1. A nonvolatile memory device comprising: a plurality of impurity regions that are formed in a substrate; a first contact that is electrically connected to at least one of the impurity regions; a second contact that is electrically connected to at least one of the impurity regions; a first information storage portion that is formed at a first height from the substrate and electrically connected to the first contact; and a second information storage portion that is formed at a second height, which is different from the first height, from the substrate and electrically connected to the second contact.
地址 Seoul KR