发明名称 |
Non-Volatile Memory Devices and Methods of Fabricating the Same |
摘要 |
A nonvolatile memory device is provided. The nonvolatile memory device comprises a plurality of impurity regions formed in a substrate, a first contact electrically connected to at least one of the impurity regions, a second contact electrically connected to at least one of the impurity regions, a first information storage portion formed at a first height from the substrate and electrically connected to the first contact, and a second information storage portion formed at a second height, which is different from the first height, from the substrate and electrically connected to the second contact. |
申请公布号 |
US2014264680(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201414195891 |
申请日期 |
2014.03.04 |
申请人 |
Kim Whan-Kyun;Kim Young-Hyun;Kim Woo-Jin |
发明人 |
Kim Whan-Kyun;Kim Young-Hyun;Kim Woo-Jin |
分类号 |
H01L27/22;H01L43/02 |
主分类号 |
H01L27/22 |
代理机构 |
|
代理人 |
|
主权项 |
1. A nonvolatile memory device comprising:
a plurality of impurity regions that are formed in a substrate; a first contact that is electrically connected to at least one of the impurity regions; a second contact that is electrically connected to at least one of the impurity regions; a first information storage portion that is formed at a first height from the substrate and electrically connected to the first contact; and a second information storage portion that is formed at a second height, which is different from the first height, from the substrate and electrically connected to the second contact. |
地址 |
Seoul KR |