SUSCEPTOR SUPPORT SHAFT WITH UNIFORMITY TUNING LENSES FOR EPI PROCESS

摘要

Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber. In some embodiments, a custom made refractive element can be removably placed on the top of the solid disc to redistribute secondary heat distributions across the susceptor and/or substrate for optimum thickness uniformity of epitaxy process.

主权项

1. A susceptor support shaft for a process chamber, comprising:
a cylindrical support shaft; and a support body coupled the support shaft, the support body comprising:
a solid disc;a plurality of tapered bases extending from the solid disc;at least three support arms extending from some of the tapered bases; andat least three dummy arms extending from some of the tapered bases.