COMPOSITION FOR FORMING UPPER LAYER FILM AND RESIST PATTERN FORMING METHOD USING SAME

摘要

[Problem] To provide: a composition for forming an upper layer film, which enables the formation of a pattern that has excellent roughness and pattern shape in a pattern forming method by means of extreme ultraviolet light exposure; and a pattern forming method which uses this composition for forming an upper layer film. [Solution] A composition for forming an upper layer film, which is characterized by containing a triphenylene derivative having a hydrophilic group and a solvent; and a method wherein a pattern is formed by applying this composition to a resist surface and then exposing and developing this composition. This composition may additionally contain a polymer.