发明名称 PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
摘要 Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.
申请公布号 US2014262038(A1) 申请公布日期 2014.09.18
申请号 US201414246915 申请日期 2014.04.07
申请人 APPLIED MATERIALS, INC. 发明人 Wang Anchuan;Chen Xinglong;Li Zihui;Hamana Hiroshi;Chen Zhijun;Hsu Ching-Mei;Huang Jiayin;Ingle Nitin K.;Lubomirsky Dmitry;Venkataraman Shankar;Thakur Randhir
分类号 H01L21/67 主分类号 H01L21/67
代理机构 代理人
主权项 1. A combination processing chamber, the chamber comprising: a lower chamber housing, wherein the lower chamber housing comprises: a first access on a first side of the lower chamber housing, anda second access on a second side of the lower chamber housing opposite the first side of the lower chamber housing; and an upper chamber housing coupled with the lower chamber housing, wherein the upper chamber housing comprises: a third access on a first side of the upper chamber housing coinciding with the first side of the lower chamber housing, andan upper processing region at least partially defined from above by a faceplate disposed within the upper chamber housing.
地址 Santa Clara CA US