| 主权项 |
1. A floor cleaning kit, comprising, in combination:
a first cleaning composition to remove film buildup caused by cleaning and polishing agents, comprising:
at least one solvent to break down film buildup;at least one surfactant or wetting agent to promote solvent penetration;water as a dilutant;a water softener additive; andinstructions regarding application, activation interval, surface scrubbing, rinsing, and drying; and a second cleaning composition to clean with minimal film residue, comprising:
at least 0.0008% by weight and not more than 0.1200% by weight of a linear alcohol surfactant and wetting agent; anda balance of deionized water as a dilutant. |
