发明名称 YTTRIA-BASED MATERIAL COATED CHEMICAL VAPOR DEPOSITION CHAMBER HEATER
摘要 Embodiments of the present invention generally relate to heated substrate supports having a protective coating thereon. The protective coating is formed from yttrium oxide at a molar concentration ranging from about 50 mole percent to about 75 mole percent; zirconium oxide at a molar concentration ranging from about 10 mole percent to about 30 mole percent; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole percent to about 30 mole percent. The alloying of yttrium oxide with a compatible oxide improves wear resistance, flexural strength, and fracture toughness of the protective coating, relative to pure yttrium oxide.
申请公布号 US2014263272(A1) 申请公布日期 2014.09.18
申请号 US201414199745 申请日期 2014.03.06
申请人 Applied Materials, Inc. 发明人 DUAN Ren-Guan;ROCHA-ALVAREZ Juan Carlos;ZHOU Jianhua
分类号 H05B3/68;C23C16/40;C23C4/10 主分类号 H05B3/68
代理机构 代理人
主权项 1. A substrate support, comprising: a heater plate; a protective coating disposed over the heater plate, the protective coating comprising: yttrium oxide at a molar concentration ranging from about 50 mole percent to about 75 mole percent;zirconium oxide at a molar concentration ranging from about 10 mole percent to about 30 mole percent; andat least one other component selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof.
地址 Santa Clara CA US