发明名称 |
METHOD FOR FORMING ELECTROCONDUCTIVE PATTERN, AND ELECTROCONDUCTIVE PATTERN SUBSTRATE |
摘要 |
This method for forming an electroconductive pattern is provided with: a lamination step for readying a photosensitive electroconductive film provided with a support film, an electroconductive layer including electroconductive fiber, and a photosensitive resin layer including a photosensitive resin, in the sequence listed, and laminating the electroconductive layer and the photosensitive resin layer so that the electroconductive layer is on a base material in intimate contact; and a patterning step for exposing and developing the photosensitive resin layer on the base material and thereby forming an electroconductive pattern. |
申请公布号 |
KR20140111024(A) |
申请公布日期 |
2014.09.17 |
申请号 |
KR20147022042 |
申请日期 |
2013.04.02 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
TANAKA HIROYUKI;YAMAZAKI HIROSHI;IGARASHI YOSHIMI;ITOU TOYOKI;OOTA EMIKO |
分类号 |
H01B13/00;H01B5/14;H05K3/02 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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