发明名称 METHOD FOR FORMING ELECTROCONDUCTIVE PATTERN, AND ELECTROCONDUCTIVE PATTERN SUBSTRATE
摘要 This method for forming an electroconductive pattern is provided with: a lamination step for readying a photosensitive electroconductive film provided with a support film, an electroconductive layer including electroconductive fiber, and a photosensitive resin layer including a photosensitive resin, in the sequence listed, and laminating the electroconductive layer and the photosensitive resin layer so that the electroconductive layer is on a base material in intimate contact; and a patterning step for exposing and developing the photosensitive resin layer on the base material and thereby forming an electroconductive pattern.
申请公布号 KR20140111024(A) 申请公布日期 2014.09.17
申请号 KR20147022042 申请日期 2013.04.02
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TANAKA HIROYUKI;YAMAZAKI HIROSHI;IGARASHI YOSHIMI;ITOU TOYOKI;OOTA EMIKO
分类号 H01B13/00;H01B5/14;H05K3/02 主分类号 H01B13/00
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