| 摘要 |
A resist composition includes (A) a compound represented by the following formula (I):
wherein each of R 1 to R 13 independently represents a hydrogen atom or a substituent, provided that at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X - represents an anion containing a proton acceptor functional group. |
