| 摘要 |
<p>The present invention relates to a power supply for a sputter, capable of repetitively applying a pulse signal interval and a black signal interval to a cathode portion of a sputter. The pulse signal interval includes a first signal array for generating a first stepped voltage to the cathode portion; and a second pulse signal array for generating a second stepped voltage, which is close to the first pulse signal array and higher in voltage than the first stepped voltage, to the cathode portion. The black signal interval is close to the pulse signal interval and does not include a pulse signal array.</p> |
