| 摘要 |
An imprint apparatus for coating a substrate with a resin by a coating mechanism, and curing the resin while pressing at least one of the substrate and a mold against the other, includes a measurement device configured to detect a position of the coating mechanism, a substrate stage configured to hold a substrate, a positioning system configured to position the substrate stage, and a controller configured to control positioning of the substrate stage by the positioning system, based on the measurement result. |
