| 摘要 |
The present invention provides an apparatus and a method for aligning a lower second workpiece and a first workpiece even in the presence of occlusion of a critical alignment pitcher of the second workpiece by the first workpiece. A vision system that guides motions of a manipulator which holds the first workpiece and a motion stage which holds the second workpiece learns at least one of secondary alignment pitchers of the first and second workpieces. Using the secondary pitcher, the vision system determines alignment between the workpieces and guides the manipulator and the motion stage so as to achieve alignment such as engagement between the first workpiece and the second workpiece. The secondary pitcher is used to limit course alignment. Predictable movements of the manipulator and/or the motion stage are used to learn a relationship between the secondary pitcher and a primary pitcher. The secondary pitcher is used in direct alignment. |
