发明名称 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV protoresist applications
摘要 Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y]  (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to−3, C′is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′is an oxidatively stable organic ligand having a charge of 0 to−4, and L′comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.
申请公布号 GB201413639(D0) 申请公布日期 2014.09.17
申请号 GB20140013639 申请日期 2013.02.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
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