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发明名称
摘要
A sputtering target including an oxide sintered body including In, Zn and Ga, wherein a surface compound and an interior compound are essentially of the same crystal type(s).
申请公布号
JP5591523(B2)
申请公布日期
2014.09.17
申请号
JP20090264086
申请日期
2009.11.19
申请人
发明人
分类号
C23C14/34;C04B35/00;H01L21/363
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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