Illumination system for use in a stereolithography apparatus

摘要

The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.

主权项

1. An illumination system for use in a stereolithography apparatus, comprising:
a planar support; a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and a multilens projector array; the multilens projector array being mechanically supported on the planar support over the two dimensional array on a plano side, and having a work surface arranged to receive a resin layer on the work surface, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the resin layer, and wherein the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side, the illumination system thus forming a rigid body.