发明名称 Display substrate, display device, and method of manufacturing the display substrate
摘要 Provided are a display substrate, a display device, and a method of manufacturing the display substrate. The display substrate includes: a substrate in which a pixel region is defined; a gate electrode and a gate pad are formed on the substrate; a gate insulating layer formed on the gate electrode and the gate pad; a buffer layer pattern overlaps the gate electrode and is formed on the gate insulating layer; an insulating film pattern formed on the buffer layer pattern; an oxide semiconductor pattern formed on the insulating film pattern; a source electrode formed on the oxide semiconductor pattern; and a drain electrode formed on the oxide semiconductor pattern and is separated from the source electrode.
申请公布号 US8836877(B2) 申请公布日期 2014.09.16
申请号 US201113277114 申请日期 2011.10.19
申请人 Samsung Display Co., Ltd. 发明人 Choi Seung-Ha;Chung Kyoung-Jae;Lee Woo-Geun
分类号 G02F1/136;H01L29/786;G02F1/1362;H01L29/66;H01L29/49;H01L27/12 主分类号 G02F1/136
代理机构 Innovation Counsel LLP 代理人 Innovation Counsel LLP
主权项 1. A display substrate comprising: a substrate in which a pixel region is defined; a gate electrode and a gate pad formed on the substrate; a gate insulating layer formed on the gate electrode and the gate pad; a buffer layer pattern that overlaps the gate electrode and that is formed on the gate insulating layer; an insulating film pattern formed on the buffer layer pattern; an oxide semiconductor pattern formed on the insulating film pattern; a source electrode formed on the oxide semiconductor pattern; and a drain electrode formed on the oxide semiconductor pattern and separated from the source electrode, wherein the buffer layer pattern, the insulating film pattern, the oxide semiconductor pattern, the source electrode, and the drain electrode have substantially the same lateral profile.
地址 KR