发明名称 Wafer detecting apparatus
摘要 A wafer detecting apparatus detects storage states of a plurality of wafers stored in a wafer container. The plurality of wafers are stored substantially horizontal in slots in the wafer container to be transferred in and out of a front opening of the wafer container. The wafer detecting apparatus includes a vertically extending illumination device that emits light through the front opening onto the plurality of wafers and an imaging device that receives the light reflected from the plurality of wafers. The imaging device is arranged substantially directly in front of the wafer container and the illumination device is arranged in at least one of left and right sides of the imaging device.
申请公布号 US8837777(B2) 申请公布日期 2014.09.16
申请号 US201213468353 申请日期 2012.05.10
申请人 Sinfonia Technology Co., Ltd. 发明人 Yasuda Katsumi;Kamigaki Toshio;Mizokawa Takumi
分类号 G06K9/00;H01L21/67 主分类号 G06K9/00
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A wafer detecting apparatus for detecting storage states of a plurality of wafers stored in a wafer container, the plurality of wafers being stored substantially horizontal in slots in the wafer container and being transferred in and out through a front opening of the wafer container, the wafer detecting apparatus comprising: an illumination device configured to emit light, through the front opening, onto the plurality of wafers stored in the wafer container from above and below each of the plurality of wafers, the illumination device extending in a vertical direction and the illumination device being arranged on one of left and right sides of the wafer container; and an imaging device configured to receive the light reflected from the plurality of wafers, the imaging device being arranged substantially directly in front of the wafer container.
地址 Tokyo JP