发明名称 |
Multi charged particle beam writing apparatus |
摘要 |
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite. |
申请公布号 |
US8835868(B2) |
申请公布日期 |
2014.09.16 |
申请号 |
US201314108844 |
申请日期 |
2013.12.17 |
申请人 |
NuFlare Technology, Inc. |
发明人 |
Touya Takanao;Ogasawara Munehiro |
分类号 |
H01J3/07;H01J37/141;G21K5/04;H01J37/317 |
主分类号 |
H01J3/07 |
代理机构 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A multi charged particle beam writing apparatus comprising:
a stage configured to mount a target object thereon and to be movable; an emission unit configured to emit a charged particle beam; an aperture member, in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings; a reduction optical system configured to reduce the multiple beams; and a doublet lens, arranged at a subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite. |
地址 |
Yokohama JP |