发明名称 |
Odorless acetone-free nail polish removing composition |
摘要 |
One aspect of the present invention comprises a nail polish removing composition that is essentially free of acetone and ethyl acetate, and is essentially free of odor. The composition includes at least one triester of glycerol and C2-C5 carboxylic acid, at least one C3-C5 glycol, at least one C4-C6 cyclic carbonate, and, optionally, at least one colorant. Another aspect of the present invention is a method of removing nail polish, comprising providing the nail polish removing composition; immersing an absorbent material in the composition, wherein the absorbent material absorbs the composition; contacting the absorbent material to nail polish for a time sufficient to plasticize the nail polish film; and removing the plasticized nail polish film by mechanically rubbing with the absorbent material, wherein the composition comprises one or more phases. |
申请公布号 |
US8835369(B2) |
申请公布日期 |
2014.09.16 |
申请号 |
US201213487639 |
申请日期 |
2012.06.04 |
申请人 |
L'Oreal |
发明人 |
Cifelli Dana |
分类号 |
C11D3/43;C11D3/20 |
主分类号 |
C11D3/43 |
代理机构 |
Novak Druce Connolly Bove + Quigg LLP |
代理人 |
Novak Druce Connolly Bove + Quigg LLP |
主权项 |
1. A nail polish remover, wherein said nail polish remover contains a composition, said composition comprising:
at least one triester of glycerol and C2-C5 carboxylic acid, at least one C3-C5 glycol, at least one C4-C6 cyclic carbonate, and optionally at least one colorant, wherein the composition is essentially free of acetone and ethyl acetate, further wherein the composition comprises the at least one C3-C5 glycol in a range from about 10% to about 30% by weight, based on the total weight of the composition, and further wherein the composition is essentially free of odor. |
地址 |
Paris FR |