发明名称 Manufacturing method of graphene substrate and graphene substrate
摘要 The invention provides a manufacturing method of a graphene-on-insulator substrate which is mass productive, of high quality, and yet is directly usable for manufacture of semiconductor devices at a low manufacturing cost. According to the manufacturing method of a graphene substrate of the invention, a metal layer and a carbide layer are heated with the metal layer in contact with the carbide layer so that carbon in the carbide layer is dissolved into the metal layer, and then the metal layer and the carbide layer are cooled so that the carbon in the metal layer is segregated as graphene on the surface of the carbide layer.
申请公布号 US8835286(B2) 申请公布日期 2014.09.16
申请号 US201113882317 申请日期 2011.11.02
申请人 NEC Corporation 发明人 Hiura Hidefumi;Tsukagoshi Kazuhito
分类号 H01L21/20;H01L21/36;C01B31/04;H01L21/02;H01L29/16 主分类号 H01L21/20
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A manufacturing method of a graphene substrate comprising: (a) heating a metal layer and a carbide layer with the metal layer placed in contact with the carbide layer to dissolve carbon in the carbide layer into the metal layer; and (b) cooling the metal layer and the carbide layer to deposit the carbon in the metal layer as graphene on the surface of the carbide layer.
地址 Tokyo JP