发明名称 |
Insulated gate bipolar transistors including current suppressing layers |
摘要 |
An insulated gate bipolar transistor (IGBT) includes a first conductivity type substrate and a second conductivity type drift layer on the substrate. The second conductivity type is opposite the first conductivity type. The IGBT further includes a current suppressing layer on the drift layer. The current suppressing layer has the second conductivity type and has a doping concentration that is larger than a doping concentration of the drift layer. A first conductivity type well region is in the current suppressing layer. The well region has a junction depth that is less than a thickness of the current suppressing layer, and the current suppressing layer extends laterally beneath the well region. A second conductivity type emitter region is in the well region. |
申请公布号 |
US8835987(B2) |
申请公布日期 |
2014.09.16 |
申请号 |
US200711711383 |
申请日期 |
2007.02.27 |
申请人 |
Cree, Inc. |
发明人 |
Zhang Qingchun |
分类号 |
H01L29/66;H01L29/08;H01L29/739;H01L29/16 |
主分类号 |
H01L29/66 |
代理机构 |
Myers Bigel Sibley & Sajovec, P.A. |
代理人 |
Myers Bigel Sibley & Sajovec, P.A. |
主权项 |
1. An insulated gate bipolar transistor, comprising:
a substrate having a first conductivity type; a drift layer on the substrate and having a second conductivity type opposite the first conductivity type; a current suppressing layer on the drift layer, the current suppressing layer having the second conductivity type and having a doping concentration that is larger than a doping concentration of the drift layer; a well region in the current suppressing layer and having the first conductivity type, wherein the well region has a junction depth that is less than a thickness of the current suppressing layer, and wherein the current suppressing layer extends laterally beneath the well region; and an emitter region in the well region and having the second conductivity type; wherein the current suppressing layer has a thickness and doping concentration that are configured to reduce current gain of a bipolar transistor portion of the transistor formed by the well region, the drift layer and the substrate, and thereby enhance carrier accumulation in a channel region of the transistor. |
地址 |
Durham NC US |