| 发明名称 | Color filter and manufacturing method thereof | ||
| 摘要 | A method for manufacturing a color filter is provided. The method includes following steps. A substrate is provided. A first filter layer is formed on a first part of a first region and a first part of a second region of the substrate. A second filter layer is formed on a second part of the second region. A third filter layer is formed on a second part of the first region and a third part of the second region. When a white beam is projected on the color filter, the first region and the second region reflect a plurality of color beams. A color filter manufactured through the method is also provided. | ||
| 申请公布号 | US8837063(B2) | 申请公布日期 | 2014.09.16 |
| 申请号 | US201012892076 | 申请日期 | 2010.09.28 |
| 申请人 | Himax Semiconductor, Inc. | 发明人 | Hung Shao-Min;Liu Han-Kang;Chen Bo-Nan |
| 分类号 | G02B5/20;G02F1/1335 | 主分类号 | G02B5/20 |
| 代理机构 | J.C. Patents | 代理人 | J.C. Patents |
| 主权项 | 1. A manufacturing method of a color filter, comprising: providing a substrate, wherein the substrate has a first region and a second region; forming a first filter layer on a first part of the first region and a first part of the second region; forming a second filter layer on a second part of the second region, wherein the step of forming the second filter layer comprises forming a plurality of first multi-film filter units on where the first part and the second part of the second region overlap each other, and when a white beam is projected on the first multi-film filter units, the first multi-film filter units reflect a third color beam; and forming a third filter layer on a second part of the first region and a third part of the second region; wherein when the white beam is projected on the color filter, the first region and the second region reflect a plurality of color beams. | ||
| 地址 | Tainan TW | ||