发明名称 Charged particle beam apparatus with cleaning photo-irradiation apparatus
摘要 A charged particle beam apparatus including a charged particle emission gun with which cleaning of a tip is possible without stopping the operation of the charged particle emission gun for a long time and without heating the tip. The charged particle emission gun includes a cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate a tip, and an optical fiber for guiding the ultraviolet light or the infrared light toward the tip. The cleaning photo-irradiation apparatus generates ultraviolet light or an infrared light with a predetermined wavelength and intensity to desorb a molecule adsorbed on the tip through photon stimulated desorption, or to desorb a molecule adsorbed on the tip through photon stimulated desorption and ionize the desorbed molecule.
申请公布号 US8835884(B2) 申请公布日期 2014.09.16
申请号 US201113994812 申请日期 2011.12.08
申请人 Hitachi High-Technologies Corporation 发明人 Arai Noriaki
分类号 H01J37/06;H01J49/00;H01J29/00;H01J49/26;H01J27/02 主分类号 H01J37/06
代理机构 Antonelli, Terry, Stout & Kraus, LLP. 代理人 Antonelli, Terry, Stout & Kraus, LLP.
主权项 1. A charged particle emission gun comprising: a tip; an extracting electrode having a central hole that is coaxial with the tip; an ion collector arranged between the tip and the extracting electrode, the ion collector having a central hole that is coaxial with the tip; a vacuum chamber that accommodates therein the tip, the extracting electrode, and the ion collector; a cooling apparatus for cooling the tip; and a cleaning photo-irradiation apparatus that generates ultraviolet light or infrared light to irradiate the tip.
地址 Tokyo JP