Semiconductor device and method for manufacturing the same

摘要

A method for manufacturing a semiconductor device includes forming a device isolation film defining an active region, forming a recess configured to expose a seam contained in the device isolation film by etching the active region and the device isolation film, forming a sacrificial film to fill the exposed seam, and forming a gate at a lower part of the recess.

主权项

1. A method for manufacturing a semiconductor device comprising:
forming a device isolation film defining an active region; forming a recess configured to expose a seam contained in the device isolation film by etching the active region and the device isolation film; forming a sacrificial film to fill the exposed seam; and forming a gate in a lower part of the recess.