发明名称 Pattern designing method, pattern designing program and pattern designing apparatus
摘要 A pattern designing method, including the steps of carrying out transfer simulation calculation and step simulation calculation by using physical layout data produced from circuit design data, and comparing a result of the transfer simulation calculation and the step simulation calculation with a preset standard; and carrying out calculation for electrical characteristics by using parameters obtained from the physical layout when as a result of the comparison, the preset standard is fulfilled, and carrying out calculation for the electrical characteristics by reflecting the result of the transfer simulation calculation and the step simulation calculation in the parameters when as the result of the comparison, the preset standard is not fulfilled, thereby extracting the parameters.
申请公布号 US8839158(B2) 申请公布日期 2014.09.16
申请号 US201113213714 申请日期 2011.08.19
申请人 Sony Corporation 发明人 Izuha Kyoko
分类号 G06F17/50;G06F1/22 主分类号 G06F17/50
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A non-transitory computer readable medium having stored thereon instructions relating to a pattern designing method that when executed on a processor system cause the processor system to perform the steps of: acquiring circuit design data, said circuit design data present, at least in part, in a computer readable technology file library with at least one technology file; using the circuit design data, producing physical layout data for a circuit design; carrying out a transfer simulation calculation and a step simulation calculation using the physical layout data, the transfer simulation including simulating the formation of an image for the circuit design using a mask, the step simulation including simulating an effect of a processing step on the image; comparing results of the transfer simulation calculation and the step simulation calculation with a preset standard, the present standard including predetermined benchmarks for the results of the simulations; carrying out a calculation of electrical characteristics of the physical layout using parameters obtained from the physical layout data when as a result of the comparison, the preset standard is fulfilled; carrying out a calculation of a capacitance value a for a cross-section of a portion of the physical layout in which the preset standard is not fulfilled when as a result of the comparison, the preset standard is not fulfilled; determining whether the capacitance value falls within a predetermined tolerance; carrying out the calculation for the electrical characteristics of the physical layout using parameters obtained from the physical layout data when the capacitance value falls within the predetermined tolerance; calculating a product of the capacitance value and a resistance value for the cross-section of the portion of the physical layout in which the preset standard was not fulfilled as a result of the comparison; determining whether the product of the capacitance value and the resistance value fall within a predetermined range therefor; registering in the technology file library the calculated product of the capacitance value and the resistance value when the product falls within the predetermined range therefor; overwriting contents of the technology library when the product of the capacitance value and the resistance value falls outside the predetermined range therefor.
地址 Tokyo JP