| 摘要 |
Disclosed are apparatus, systems, and methods for operating a radiation source that jets up a fuel for plasma generation and for recycling of the unused fuel. For an illumination system of a lithographic apparatus, a radiation source is provided that jets up a liquid fuel to generate plasma for generating high energy radiation such as extreme ultra-violet (EUV) radiation and recycle the unused liquid fuel. The radiation source includes a first reservoir (206), a channel (204) coupled to the first reservoir, and a second reservoir (216). The first reservoir holds a liquid fuel (218) and the liquid fuel is moved through the channel towards a distal end (205) of the channel. The channel passes through a housing (202) and the distal end of the channel is at an outer surface of the housing. The second reservoir collects at least a portion of the liquid fuel that has moved out of the distal end of the channel. |
