| 摘要 |
A method of processing a substrate in a reactor by pulsing RF power according to the present invention includes a step of applying the RF power of a pulse to a reactor in order to process a substrate, a step of monitoring data from the reactor which includes data from an optical sensor installed at the reactor and represents the anomaly pulse of the RF power, a step of counting the number of the anomaly pulse of the RF power in the monitored data, a step of determining whether the number of the anomaly pulse of the RF power is allowable or not, and a step of starting a predetermined sequence when the number of the anomaly pulse of the RF power is not allowable. |
