发明名称 LATERAL HIGH-VOLTAGE TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A lateral high-voltage transistor includes: a semiconductor substrate; a semiconductor layer being provided on one main surface of the semiconductor substrate; a source region being provided selectively in a surface of the semiconductor layer; a drain region being provided selectively in the surface of the semiconductor layer; a gate electrode provided on a part of the semiconductor layer between the source region and the drain region with interposition of the gate insulating film; and a drift region being provided selectively in the surface of the semiconductor layer. The drift region includes a stripe-shaped diffusion layer extending in parallel with a direction from the drain region toward the source region. The stripe-shaped diffusion layer includes linear diffusion layers each including stripe-shaped diffusion regions that are adjacent to each other such that double diffusion occurs in a portion where the stripe-shaped diffusion regions are adjacent to each other.</p>
申请公布号 KR101440389(B1) 申请公布日期 2014.09.15
申请号 KR20130112975 申请日期 2013.09.24
申请人 发明人
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
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