| 摘要 |
Provided is a substrate processing method which prevents the electrification of a substrate which has a surface with a structure. A substrate processing method includes rotating a substrate around the center axis of the substrate, starting the irradiation of a soft X-ray to the surface of the substrate, starting the supply of deionized water to the surface of the substrate when or after starting the irradiation of the soft X-ray, stopping the supply of deionized water to the surface of the substrate, and then stopping the irradiation of the soft X-ray to the surface of the substrate. While supplying the deionized water to the surface of the substrate, the soft X-ray is always radiated to the surface of the substrate, thereby preventing the electrification of a structure formed on the surface of the substrate. |
