发明名称 ETCHING METHOD FOR MANUFACTURING DISPLAY PANEL WITH CURVED SHAPE
摘要 The present invention relates to a substrate etching method for manufacturing a curved display panel by etching the planes of a first substrate and a second substrate. Wherein, a liquid crystal layer is formed between the first substrate and the second substrate. When a driving circuit unit is combined with a display panel unit, a protection layer is formed to protect an area in which the liquid crystal is formed. The driving circuit unit is protected against an etchant. After the non-etching areas of the first and second substrates are masked, the planes of the first and second substrates are etched when the masked display panel unit is fixed. Thereby, the substrate etching method is used in a curved display panel manufacturing process by obtaining a thin film substrate without damage to the driving circuit in an etching process.
申请公布号 KR101437534(B1) 申请公布日期 2014.09.15
申请号 KR20120103230 申请日期 2012.09.18
申请人 发明人
分类号 G02F1/13;G02F1/1345 主分类号 G02F1/13
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