| 摘要 |
<p>A light-emitting apparatus and a projection system, comprising: a first laser light source (210); a second laser light source (220); an optical path adjustment apparatus (250) that receives a first laser light and a second laser light entering from a same direction and emits the lights in a different direction; a first lens (260) that receives the first laser light emitted by the optical path adjustment apparatus (250) and focuses the light to a wavelength conversion apparatus (230); a second lens (270) that is identical to the first lens (260) and that receives the second laser light emitted by the optical path adjustment apparatus (250) and focuses the light to a scattering apparatus (240); the wavelength conversion apparatus (230) that converts the first laser light into an excited light and emits same to the first lens (260); the scattering apparatus (240) that scatters the second laser light and then emits same to the second lens (270). The optical path length running from the wavelength conversion apparatus (230) to the first lens (260) is equal to the optical path length running from the scattering apparatus (240) to the second lens (270), while the optical path lengths running from the first lens (260) and from the second lens (270) to the optical path adjustment apparatus (250) are equal. The excited light emitted by the first lens (260) and the second laser light emitted by the second lens (270) are overlapped in optical path after passing through the optical path adjustment apparatus (250). The light-emitting apparatus and the projection system that employ this structure are of increased evenness in light mixing and are structurally compact.</p> |
