| 摘要 |
In order to reduce the field curvature of an image rendered by electron beams from a planar electron beam source and correct distortion, provided is an electron beam irradiation device provided with: a planar electron beam source in which a plurality of electron beam generation sources are arranged; a condenser lens array which has a plurality of condenser lenses respectively provided to correspond to the plurality of electron beam generation sources; and an electron lens on which a plurality of electron beams from the plurality of electron beam generation sources are incident via the condenser lens array, and which scales down an image formed by the plurality of electron beams. Among the plurality of electron beam generation sources, a first electron beam generation source distant from the center emits electrons with higher energy than a second electron beam generation source close to the center does, and among the plurality of condenser lenses, the focal length of a first condenser lens corresponding to the first electron beam generation source is made longer than that of a second condenser lens corresponding to the second electron beam generation source. |
