LASER ANNEALING DEVICE, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE

摘要

A laser annealing device according to the invention of the present application is characterized in being provided with: a stage upon which to place an object to be heated; a first laser element which emits a first continuous laser light; first optical assembly which guides the first continuous laser light to the object to be heated, and forms a first irradiated area on the object to be heated; a second laser element which emits a second continuous laser light of shorter wavelength than the first continuous laser light; second optical assembly which guides the second continuous laser light to the object to be heated, and forms a second irradiated area on the object to be heated; and a system controller which scans the first irradiated area and the second irradiated area so as to scan at least a portion of the first irradiated area before scanning the second irradiated area, with regard to each portion of the object to be heated.