发明名称 VAPOR DEPOSITION MASK MANUFACTURING METHOD AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
摘要 A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.
申请公布号 KR101439219(B1) 申请公布日期 2014.09.12
申请号 KR20147016633 申请日期 2013.01.11
申请人 发明人
分类号 C23C14/24;H01L51/56;H05B33/10 主分类号 C23C14/24
代理机构 代理人
主权项
地址