发明名称 UNEVENNESS INSPECTION SYSTEM, UNEVENNESS INSPECTION METHOD, AND UNEVENNESS INSPECTION PROGRAM
摘要 An unevenness inspection system is provided with a capturing unit for acquiring a captured image of an inspection object, an image generation unit for generating an image for inspecting color unevenness and an image for inspecting luminance unevenness on the basis of the captured image, a calculation unit for calculating an evaluation parameter using both the image for inspecting color unevenness and the image for inspecting luminance unevenness, and an inspection unit for inspecting unevenness using the evaluation parameter thus calculated. The image generation unit subjects the captured image to an image separation process for separating the color component and the luminance component to thereby generate a color component image and a luminance component image, individually subjects the color component image and the luminance component image to filter processing in which consideration is given to visual spatial frequency characteristics, and generates a color unevenness inspection image and a luminance unevenness inspection image on the basis of the filter-processed color component image and luminance component image. The calculation unit calculates an evaluation parameter with consideration given to uneven visibility with respect to both color and luminance.
申请公布号 WO2014136561(A1) 申请公布日期 2014.09.12
申请号 WO2014JP53706 申请日期 2014.02.18
申请人 SONY CORPORATION 发明人 TOMIOKA, SATOSHI
分类号 G01M11/00;G01N21/88 主分类号 G01M11/00
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