发明名称 |
REFLECTOR AND CVD REACTOR FOR MANUFACTURING POLYSILLICON BY USING THE SAME |
摘要 |
PURPOSE: A reflector and a CVD(Chemical Vapor Deposition) reactor for manufacturing polysilicon using the same are provided to reduce an energy consumption amount and production costs by improving the thermal decomposition reaction efficiency of trichloroethylene. CONSTITUTION: A reflector(2) is installed inside a CVD(Chemical Vapor Deposition) reactor(1). The reflector forms a predetermined internal space accepting a slim load(3). A reflective material is formed in an inner wall of the reflector. The reflective material efficiently blocks radiant energy coming out from a heated slim load. The radiant energy reflected through the reflector is reused for the silicon deposition reaction. |
申请公布号 |
KR101440049(B1) |
申请公布日期 |
2014.09.12 |
申请号 |
KR20100110596 |
申请日期 |
2010.11.08 |
申请人 |
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发明人 |
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分类号 |
C23C16/06;C23C16/44;F24J2/10;H01L21/205 |
主分类号 |
C23C16/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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