SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing device (1) according to an embodiment comprises: a table (4) which supports a substrate (W); a solvent supply unit (8) for supplying the surface of a substrate (W) on the table (4) with a volatile solvent; and an irradiation unit (10) which functions as a heater for heating the substrate (W) to change the volatile solvent into liquid droplets with an air layer generated on the surface of the substrate (W) supplied with the volatile solvent by irradiating the substrate (W) supplied with the volatile solvent with light. Thereby, it is possible to favorably dry a substrate while suppressing the collapse of a pattern.