| 摘要 |
PROBLEM TO BE SOLVED: To provide a fine particle forming apparatus which can uniformly deposit predetermined silicon nanoparticles on a carbon powder by using a carbon powder as an object to be deposited and depositing silicon as a deposition material.SOLUTION: A catalyst metal is carried on the surface of a carbon powder by irradiating plasma of nanoparticles (a deposition body) from above while agitating a carbon powder (an object to be deposited 7), which is a carrier accommodated in an agitation vessel 73. In this process, an arm part 89 of a stamp 85 ascends a slope formed by obliquely cutting an edge 90 of an upper opening in conjunction with rotation of the agitation vessel 73. When the arm part 89 ascends to the uppermost stage, the arm part 89 is dropped suddenly to a lower step by a level difference 90c to crush a mass of the object to be deposited 7 located below the arm part 89. Since silicon of a deposition material must conduct electricity, specific resistance thereof must be kept at 0.1 &OHgr;cm or less. |
