发明名称 METHOD OF MANUFACTURING SURFACE EMITTING LASER ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To stably mass produce a surface emitting laser element having the magnitude of the positional displacement amount of the centroid of an optical filter with respect to the center of a current passage region of 0.1μm or less, while controlling transverse-mode oscillation.SOLUTION: A dielectric layer 111a having an optical thickness ofλ/4 is laminated on an upper surface of a laminated body, a resist pattern 120a defining an outer perimeter of a mesa structure and a resist pattern 120b protecting a region corresponding to a part with a low reflection rate in an emitting region are formed and cured on the upper surface of the dielectric layer, and thereafter the dielectric layer 111a is etched. Then, a second resist pattern 123 protecting a region corresponding to all of the emitting region is formed, and the laminated body is etched using the first resist pattern and the second resist pattern as an etching mask to form the mesa structure. A selectively-oxidized layer is selectively oxidized, a confined structure where an oxide surrounds a current passing region is formed, and a dielectric layer having an optical thickness of 2λ/4 is laminated on the upper surface of the laminated body.</p>
申请公布号 JP2014168074(A) 申请公布日期 2014.09.11
申请号 JP20140075934 申请日期 2014.04.02
申请人 RICOH CO LTD 发明人 SHOJI HIROYOSHI;SATO SHUNICHI;ITO AKIHIRO;HARASAKA KAZUHIRO
分类号 H01S5/183;B41J2/47 主分类号 H01S5/183
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