| 发明名称 |
METHOD OF MANUFACTURING AN ORGANIC SEMICONDUCTOR THIN FILM |
| 摘要 |
A method of manufacturing an organic semiconductor thin film includes coating an organic semiconductor solution on a substrate, and shearing the organic semiconductor solution in a direction that results in a shearing stress being applied to the organic semiconductor solution to form the organic semiconductor thin film, wherein a speed of the shearing is controlled such that an intermolecular distance of the organic semiconductor solution is adjusted. |
| 申请公布号 |
US2014256085(A1) |
申请公布日期 |
2014.09.11 |
| 申请号 |
US201414281380 |
申请日期 |
2014.05.19 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAO Zhenan;GIRI Gaurav;LEE Sang-yoon;MANNSFELD Stefan |
| 分类号 |
H01L51/00 |
主分类号 |
H01L51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing an organic semiconductor thin film, the method comprising:
coating an organic semiconductor solution on a substrate; and shearing the organic semiconductor solution in a direction that results in a shearing stress being applied to the organic semiconductor solution to form the organic semiconductor thin film, wherein a speed of the shearing is controlled such that an intermolecular distance of the organic semiconductor solution is adjusted. |
| 地址 |
Suwon-Si KR |
