发明名称 GaN-BASED COMPOUND SEMICONDUCTOR MANUFACTURING METHOD AND GaN-BASED COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a GaN-based compound semiconductor excellent in emission property by inspecting an impurity content in a high-purity ammonia gas used as a material gas, which has considerable effect on luminance characteristics and controlling the impurity content.SOLUTION: In a GaN-based compound semiconductor manufacturing method by metal organic chemical vapor deposition, a concentration of a hydrocarbon-based compound which has oxygen atoms in molecules, in an ammonia gas used as a material gas is set at not exceeding 1.0 ppmV.
申请公布号 JP2014168015(A) 申请公布日期 2014.09.11
申请号 JP20130039908 申请日期 2013.02.28
申请人 SHOWA DENKO KK 发明人 HOSHINO YASUYUKI;MURAKAWA MINAKO;ATOBE HITOSHI
分类号 H01L21/205;C23C16/34;H01L33/32 主分类号 H01L21/205
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