| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film measurement instrument and measurement method which is capable of reducing calculation time and improving measurement accuracy even if the number of film parameters of multilayer film is increased.SOLUTION: The film measurement instrument includes a calculation unit which receives a measured spectrum of reflected light which is reflected from a substrate having a multilayer film formed thereon by irradiating light onto the substrate, and collates a theoretical spectrum theoretically calculated on the basis of a laminate structure of the multilayer film with the measured spectrum a plurality of times to calculate film parameters of respective layers in the multilayer film. The calculation unit links film parameters of a plurality of layers of the same type in the laminate structure of the multilayer film, calculates a representative film parameter for each link, and calculates film parameters of respective films in the multilayer film in accordance with the representative film parameters.</p> |
