| 发明名称 |
POLISHING COMPOSITION |
| 摘要 |
A polishing composition of the present invention is used for polishing an object containing a phase-change alloy and is characterized by containing ammonium ions (NH4+). The polishing composition may further contain abrasive grains, such as colloidal silica. |
| 申请公布号 |
US2014251950(A1) |
申请公布日期 |
2014.09.11 |
| 申请号 |
US201214346921 |
申请日期 |
2012.09.28 |
| 申请人 |
Yoshizki Yukinobu;Izawa Yoshihiro |
发明人 |
Yoshizki Yukinobu;Izawa Yoshihiro |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polishing composition to be used for polishing an object containing a phase-change alloy, comprising ammonium ions (NH4+). |
| 地址 |
Kiyosu-shi JP |
