| 发明名称 |
FABRY-PEROT THIN ABSORBER FOR EUV RETICLE AND A METHOD OF MAKING |
| 摘要 |
A Fabry-Perot thin absorber for an extreme ultraviolet (EUV) reticle and a method of making is disclosed. Embodiments include forming a molybdenum/silicon (Mo/Si) multilayer on an upper surface of a substrate; forming a ruthenium (Ru) capping layer over the Mo/Si multilayer; forming an absorber cavity layer over the Ru layer; forming two or more pairs of a silicon (Si) layer and an absorbing layer over the absorber cavity layer; and etching the Si layers, absorbing layers, and the absorber cavity layer to form a stack. |
| 申请公布号 |
US2014254001(A1) |
申请公布日期 |
2014.09.11 |
| 申请号 |
US201313788315 |
申请日期 |
2013.03.07 |
| 申请人 |
SUN Lei;Wood, II Obert Reeves |
发明人 |
SUN Lei;Wood, II Obert Reeves |
| 分类号 |
G02B5/28 |
主分类号 |
G02B5/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
forming a molybdenum/silicon (Mo/Si) multilayer on an upper surface of a substrate; forming a ruthenium (Ru) layer over the Mo/Si multilayer; forming an absorber cavity layer over the Ru layer; forming two or more pairs of a silicon (Si) layer and an absorbing layer over the absorber cavity layer; and etching the Si layers, absorbing layers, and the absorber cavity layer to form a stack. |
| 地址 |
Albany NY US |
